ROTTERDAM, The Netherlands, Nov 19 (Bernama) -- Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology.
As part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system, QUADRA, at Imec’s advanced R&D facility in Leuven. The two organizations will jointly develop next-generation metrology solutions to address critical challenges across the semiconductor manufacturing value chain, including:
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